Māka uila Ethylene glycol monoethyl ether series (EE, DE)/ CAS 110-80-5/ CAS 111-90-0 Kiʻi Hōʻikeʻike

Māka uila Ethylene glycol monoethyl ether moʻo (EE, DE)/ CAS 110-80-5/ CAS 111-90-0

ʻO ka wehewehe pōkole:

Ethylene glycol monoethyl ether (EE); CAS 110-80-5

Diethylene glycol monoethyl ether (DE); CAS 111-90-0

Papa uila

Huahana Huahana

Ethylene glycol monoethyl ether series (EE, DE)

'ikamu	Ethylene glycol monoethyl ether (EE)	Diethylene glycol monoethyl ether (DE)
CAS	110-80-5	111-90-0
ʻAno molekala	C₂H₅A₂CH₂OH	C₂H₅A₂CH₂A₂CH₂OH
Ka nana aku	Wai waihoʻoluʻu a maopopo	Wai waihoʻoluʻu a maopopo
Maʻemaʻe(GC)%≥	99.5	99.0
Laulā hoʻoheheʻe (℃/760mmHg)	133.5-138.0	194.0-205.0
Māmā (KF) %≤	0.1	0.1
Kaʻakika (e like me ka HAC) %≤	0.005	/
Kaumaha kikoʻī (d4²⁰)	0.929±0.005	0.989±0.005
Kala(Pt-Co)≤	15	15
Maʻiʻo o ka metala ion≤	10ppb (no nā koi kūikawā ≤1ppb)	10ppb (no nā koi kūikawā ≤1ppb)
Pūʻolo a me ka lawe ʻana	190 a i ʻole 194KGS/Drum Kemika ʻino	200KGS/Drum Kemika hazardous

Hoʻohana Huahana

Ethylene gycol monoethyl ether moʻo , he 'ano o ka 'oihana uila me ka hana maika'i loa, ho'ohana nui 'ia ka LCD photo-resistance diluent i ka hana 'ana i ka LCD a me ka optical resistance, photo-resist remover, stripping agent, detergent no IC, photo resistance-removing buffer solution, corrosive processing and nā kemika ʻē aʻe e koi ana i nā kikoʻī kūikawā; hoʻohana nui ʻia e like me ka solvent no ka hana uila.

Mua: Ethylene glycol monomethyl eter moʻo (EM, DEM, TEM)/ CAS 109-86-4/ CAS 111-77-3/ CAS 112-35-6

Aʻe: Māka uila Ethylene glycol monobutyl eter moʻo (EB, DEB)/ CAS 111-76-2/ CAS 112-34-5

Diethylene glycol monoethyl ether (DE)